Product Overview
Water and waste water treatment defoamer. Modified silicone defoamer emulsion (20% active). Emulsifier free technology. For sophisticated & special treatments (zero liquid discharge plants, distillation & evaporation units, membrane reactors). Highly effective at low dosages. Defoamers Modified silicone defoamer emulsion (20% active) RegionsAsia except China; Australia & New Zealand; Europe, Middle East and Africa; Greater China; Latin America; North AmericaProduct GroupAdditivesMarket ApplicationsAdditivesSegment ApplicationsPaint & CoatingsChemistryAdditives; Deaeraters; Additives; DefoamersTechnologyAdditivesFormulation AdvantagesShear stabilityApplication AdvantagesFaster cycle time; Circulation stabilityFinal Product AdvantagesImproved degassing; Low blisteringGreen AttributesAPEO free Allnex Allnex Additives and Modifiers,Silicon additives,Anti foaming agent Paints coatings and inks
Product Identity
| Chemical name | Defoamers |
|---|---|
| Chemical composition | Modified silicone defoamer emulsion (20% active) |
Processing & Availability
- Additional product information
- Segment Applications
- Additional product information
- Paint & Coatings
- Additional product information
- Chemistry
- Additional product information
- Additives; Deaeraters; Additives; Defoamers
- Additional product information
- Technology
- Additional product information
- Additives
- Additional product information
- Formulation Advantages
- Additional product information
- Shear stability
- Additional product information
- Application Advantages
- Additional product information
- Faster cycle time;
- Additional product information
- Circulation stability
- Additional product information
- Final Product Advantages
- Additional product information
- Improved degassing;
- Additional product information
- Low blistering
- Additional product information
- Green Attributes
- Additional product information
- APEO free
Technical Documents & Source References
No technical PDF is referenced in the source record for this product.